TANTALUM SILICIDE CAS# 12039-79-1
TANTALUM SILICIDE CAS# 12039-79-1 , Promotion Season Now in Store and Free Sample for Testing with Factory Price
Chemical Name: TANTALUM SILICIDE
CAS No.: 12039-79-1
Molecular Formula: Si2Ta
Molecular weight: 237.12
Sample: Available
TANTALUM SILICIDE CAS# 12039-79-1: The Complete Guide
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What is TANTALUM SILICIDE CAS# 12039-79-1?
- With the progress of science and technology and the development of society, chemical products have invariably permeated our daily lives, in medicine, food, cosmetics, electronics, industry, and other areas, becoming an essential part of our lives. One such product is TANTALUM SILICIDE which has developed particularly rapidly in recent years. Do you know about TANTALUM SILICIDE ?
- The official answer: Metal silicides have metal-like conductivity, high temperature properties, oxidation resistance and compatibility with the production process of silicon integrated circuits. Transition metal silicides can be used for low resistance gates and internal wiring, Schottky gates, and resistance contacts. Tantalum silicide preparation methods include: combustion synthesis (CS) or self-propagating high temperature synthesis method, arc melting method and so on. Combustion synthesis or self-propagating high-temperature synthesis is a method of synthesizing intermetallic compounds using element/compound reaction exothermic heat. It has the advantages of simple equipment, low energy consumption, short synthesis time, etc., and its main disadvantages are fast reaction speed, difficult process control, and easy presence of heterogeneous phases. The combustion synthesis of tantalum silicide requires preheating to start a reaction to achieve synthesis, but the Chemicalbook is stored in a phase other than the disililide. Arc melting generally requires a long uniformization time, and the loss of silicon due to volatilization during the melting process may lead to the formation of some heterogeneous phases. Plasma spraying technology because of its jet temperature up to 10000 °C, jet speed of 300-400m /s, set high temperature melting, rapid solidification and near net forming and other advantages in one, and the technology is not limited by shape or size, easy to achieve its short process of preparation and forming, and developed into a new type of parts forming technology, has been used to prepare some parts. The use of plasma spraying technology to prepare tantalum silicide powder into a block, which requires high purity tantalum silicide powder as a raw material. Thus, how to get a high-purity tantalum silicide (no heterogeneous generation) powder becomes the key. apply
What’s the application of TANTALUM SILICIDE CAS# 12039-79-1?
Tantalum silicide has high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance and good compatibility with silicon, carbon and other matrix materials and other excellent properties, as a gate material, integrated circuit connection line, high temperature oxidation coating, etc., in the electric heating components, high temperature structural parts, electronic devices and other aspects have been studied and applied.
Conclusion
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